Femtosecond pulsed laser deposition of nanostructured TiO2 films in atmosphere

Femtosecond pulsed laser deposition of silicon thin films

: Optimisation of femtosecond pulsed laser deposition parameters for the fabrication of silicon thin films is discussed. Substrate temperature, gas pressure and gas type are used to better understand the deposition process and optimise it for the fabrication of high-quality thin films designed for optical and optoelectronic applications.

Pulsed Laser Deposition of Hydroxyapatite Thin Films

Pulsed laser deposition of VO2 thin films

High quality vanadium dioxide ~VO2! thin films have been successfully deposited by pulsed laser deposition without postannealing on ~0001! and ~101̄0! sapphire substrates. X-ray diffraction reveals that the films are highly oriented with ~010! planes parallel to the surface of the substrate. VO2 thin films on ~0001! and ~101̄0! substrates show semiconductor to metal transistions with electrical r...

PULSED LASER DEPOSITION OF BaCe0.85Y0.15O3 FILMS F.W.Dynys

Pulsed laser deposition has been used to grow nanostructured BaCe0.85Y0.15O3films. The objective is to enhance protonic conduction by reduction of membrane thickness. Sintered samples and laser targets were prepared by sintering BaCe0.85Y0.15O3powders derived by solid state synthesis. Films 2 to 6 μm thick were deposited by KrF excimer laser on Si and porous Al2O3 substrates. Nanocrystalline fi...

Optical properties of SiOx nanostructured films by pulsed-laser deposition at different substrate temperatures